Design and fabrication of SiO2/Si3N4 integrated-optics waveguides on silicon substrates

Design and fabrication of SiO2/Si3N4 integrated-optics waveguides on silicon substrates

The design and fabrication of silicon-based optical waveguides are revisited. The goal is to develop a novel design and deposition process to minimize leakage losses. Interface roughness and Si3N4 stoichiometry are examined. The optical loss is measured and contributions from scattering and absorpti...

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Veröffentlicht in:IEEE transactions on microwave theory and techniques 2002-01, Vol.50 (1), p.9-12
Hauptverfasser: Bulla, D.A.P, Borges, B.-H.V, Romero, M.A, Morimoto, N.I, Neto, L.G
Format: Artikel
Sprache:eng
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Zusammenfassung:The design and fabrication of silicon-based optical waveguides are revisited. The goal is to develop a novel design and deposition process to minimize leakage losses. Interface roughness and Si3N4 stoichiometry are examined. The optical loss is measured and contributions from scattering and absorption are determined. (Author)
ISSN:0018-9480
1557-9670
DOI:10.1109/22.981236