Rod cathode arc-activated deposition (RAD) — a new plasma-activated electron beam PVD process

The paper presents a new plasma-activated PVD process — the so-called rod cathode arc-activated deposition (RAD) process. This process has been engineered for high rate electron beam evaporation in the power range of 30–300 kW and is well matched to large area deposition. The plasma is generated by an arc discharge embedded in the vapour stream of evaporated material. An additional rod-shaped hot electrode is used as the cathode of the arc discharge. The electrode is heated by a certain part of the beam power. The RAD process is demonstrated by means of the plasma-activated deposition of stainless steel coatings. A high deposition rate of the order of 0.1–2 μm s −1 and an intense ion bombardment at an ion current density of 10–150 mA cm −2 have been measured on the substrate. Some relations between microstructure of the layers, layer properties and process parameters are shown. Finally, an outlook about potential applications of this technology is presented.