Wear resistant carbon coatings deposited without substrate bias voltage
A DC magnetron sputtering process is described which permits the deposition of highly wear-resistant carbon coatings without substrate bias voltage. The coatings, with a thickness of up to 10 μm, are deposited on several materials such as hardened high-speed steel and ceramics, with typical growth r...
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Veröffentlicht in: | Thin solid films 2001-11, Vol.398, p.187-192 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A DC magnetron sputtering process is described which permits the deposition of highly wear-resistant carbon coatings without substrate bias voltage. The coatings, with a thickness of up to 10 μm, are deposited on several materials such as hardened high-speed steel and ceramics, with typical growth rates in the range of 1.5 μm/h. The main structural feature of the coatings is an amorphous carbon network with dominating graphitic bonding. Despite this structural feature, the coatings exhibit a high wear resistance. The friction coefficient with a hard metal counter body is in the range of 0.1–0.15 and the wear volume is distinctly lower than with other hard coating materials such as a-C:H. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/S0040-6090(01)01426-2 |