Wear resistant carbon coatings deposited without substrate bias voltage

A DC magnetron sputtering process is described which permits the deposition of highly wear-resistant carbon coatings without substrate bias voltage. The coatings, with a thickness of up to 10 μm, are deposited on several materials such as hardened high-speed steel and ceramics, with typical growth r...

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Veröffentlicht in:Thin solid films 2001-11, Vol.398, p.187-192
Hauptverfasser: Rother, B, Herrmann, U, Schulze, S
Format: Artikel
Sprache:eng
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Zusammenfassung:A DC magnetron sputtering process is described which permits the deposition of highly wear-resistant carbon coatings without substrate bias voltage. The coatings, with a thickness of up to 10 μm, are deposited on several materials such as hardened high-speed steel and ceramics, with typical growth rates in the range of 1.5 μm/h. The main structural feature of the coatings is an amorphous carbon network with dominating graphitic bonding. Despite this structural feature, the coatings exhibit a high wear resistance. The friction coefficient with a hard metal counter body is in the range of 0.1–0.15 and the wear volume is distinctly lower than with other hard coating materials such as a-C:H.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(01)01426-2