Non-vacuum laser deposition of buffer layers for coated conductors

Non-vacuum laser deposition of buffer layers for coated conductors

A pulsed TEA-CO 2 laser in combination with the dynamic fluidized bed powder feeder was employed to deposit a thin CeO 2 buffer layer on the polycrystalline Ni-substrate in a non-vacuum environment. Use of the 30° powder jet inclination with respect to the laser beam axis along with the nano size pr...

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Veröffentlicht in:Thin solid films 1999-02, Vol.340 (1), p.77-86
Hauptverfasser: Dahotre, Narendra B., Semak, Vladimir, Xiao, Chenghe, McCay, Mary Helen
Format: Artikel
Sprache:eng
Schlagworte:
Buffer layer
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Laser
Laser deposition
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Nickel
Physics
Superconductivity
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Beschreibung
Zusammenfassung:A pulsed TEA-CO 2 laser in combination with the dynamic fluidized bed powder feeder was employed to deposit a thin CeO 2 buffer layer on the polycrystalline Ni-substrate in a non-vacuum environment. Use of the 30° powder jet inclination with respect to the laser beam axis along with the nano size precursor powder deposited a smooth layer on the entire surface of the substrate. Both EDS and X-ray diffractometry analyses were employed to confirm the stoichiometric nature of the deposited CeO 2 buffer layer.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(98)01346-7