Measuring the anisotropic thermal diffusivity of silicon nitride grains by thermoreflectance microscopy
High-resolution thermoreflectance microscopy measurements were performed at five frequencies on rod-shaped Si 3N 4 grains in a ceramic. Our heat diffusion model takes account of the coating and of a coating/substrate resistance. The parameters are adjusted to fit the measurements at the five frequen...
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Veröffentlicht in: | Journal of the European Ceramic Society 1999-01, Vol.19 (8), p.1631-1639 |
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container_title | Journal of the European Ceramic Society |
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creator | Li, Bincheng Pottier, L. Roger, J.P. Fournier, D. Watari, K. Hirao, K. |
description | High-resolution thermoreflectance microscopy measurements were performed at five frequencies on rod-shaped Si
3N
4 grains in a ceramic. Our heat diffusion model takes account of the coating and of a coating/substrate resistance. The parameters are adjusted to fit the measurements at the five frequencies simultaneously. The principal diffusivities obtained in individual grains are 0·32
cm
2
s
−1 along the
a-axis, and 0·84
cm
2
s
−1 along the
c-axis (corresponding conductivities: 69 and 180
W
m
−1
K
−1). The thermal anisotropy inside individual Si
3N
4 grains is found to be intrinsic, without direct connection with their elongated shape. ‘Macroscopic’ diffusivities, obtained by mirage effect, are different from the values measured inside individual grains, as a consequence of the dispersion of the grains' orientations in the ceramic and of a second-phase effect. |
doi_str_mv | 10.1016/S0955-2219(98)00258-1 |
format | Article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_27042684</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0955221998002581</els_id><sourcerecordid>27042684</sourcerecordid><originalsourceid>FETCH-LOGICAL-c485t-4ff7fb508e773ee82d789fc1f4d1cb29091d6cd21c8cae91b0000e94331e7e163</originalsourceid><addsrcrecordid>eNqFkMtKBDEQRYMoOD4-QchCRBetqX4mK5HBFyguVHAXMunKWNLTGZNuYf7e7hnRpbUpCu6tunUYOwJxDgLKi2ehiiJJU1CnSp4JkRYygS02AVllSQnqbZtNfiW7bC_GDyGgEkpN2PwRTewDtXPevSM3LUXfBb8kO85hYRpek3N9pC_qVtw7Hqkh61veUheoRj4PhtrIZ6uNwQd0DdrOtBb5gmzw0frl6oDtONNEPPzp--z15vplepc8PN3eT68eEpvLokty5yo3K4TEqsoQZVpXUjkLLq_BzlIlFNSlrVOw0hpUMBNDocqzDLBCKLN9drLZuwz-s8fY6QVFi01jWvR91Gkl8rSU-SAsNsIxYRxC62WghQkrDUKPWPUaqx6ZaSX1GquGwXf8c8BEaxoXhkcp_pllplQx5rjcyHB49osw6GgJByY1hYGOrj39c-gbIc-PDA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>27042684</pqid></control><display><type>article</type><title>Measuring the anisotropic thermal diffusivity of silicon nitride grains by thermoreflectance microscopy</title><source>Elsevier ScienceDirect Journals</source><creator>Li, Bincheng ; Pottier, L. ; Roger, J.P. ; Fournier, D. ; Watari, K. ; Hirao, K.</creator><contributor>WCA</contributor><creatorcontrib>Li, Bincheng ; Pottier, L. ; Roger, J.P. ; Fournier, D. ; Watari, K. ; Hirao, K. ; WCA</creatorcontrib><description>High-resolution thermoreflectance microscopy measurements were performed at five frequencies on rod-shaped Si
3N
4 grains in a ceramic. Our heat diffusion model takes account of the coating and of a coating/substrate resistance. The parameters are adjusted to fit the measurements at the five frequencies simultaneously. The principal diffusivities obtained in individual grains are 0·32
cm
2
s
−1 along the
a-axis, and 0·84
cm
2
s
−1 along the
c-axis (corresponding conductivities: 69 and 180
W
m
−1
K
−1). The thermal anisotropy inside individual Si
3N
4 grains is found to be intrinsic, without direct connection with their elongated shape. ‘Macroscopic’ diffusivities, obtained by mirage effect, are different from the values measured inside individual grains, as a consequence of the dispersion of the grains' orientations in the ceramic and of a second-phase effect.</description><identifier>ISSN: 0955-2219</identifier><identifier>EISSN: 1873-619X</identifier><identifier>DOI: 10.1016/S0955-2219(98)00258-1</identifier><language>eng</language><publisher>Oxford: Elsevier Ltd</publisher><subject>Applied sciences ; Building materials. Ceramics. Glasses ; Ceramic industries ; Chemical industry and chemicals ; Exact sciences and technology ; General studies ; non-destructive evaluation ; photoreflectance microscopy ; Si 3N 4 ; Technical ceramics ; thermal conductivity</subject><ispartof>Journal of the European Ceramic Society, 1999-01, Vol.19 (8), p.1631-1639</ispartof><rights>1999 Elsevier Science Ltd</rights><rights>1999 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c485t-4ff7fb508e773ee82d789fc1f4d1cb29091d6cd21c8cae91b0000e94331e7e163</citedby><cites>FETCH-LOGICAL-c485t-4ff7fb508e773ee82d789fc1f4d1cb29091d6cd21c8cae91b0000e94331e7e163</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0955221998002581$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3537,27901,27902,65306</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=1839956$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><contributor>WCA</contributor><creatorcontrib>Li, Bincheng</creatorcontrib><creatorcontrib>Pottier, L.</creatorcontrib><creatorcontrib>Roger, J.P.</creatorcontrib><creatorcontrib>Fournier, D.</creatorcontrib><creatorcontrib>Watari, K.</creatorcontrib><creatorcontrib>Hirao, K.</creatorcontrib><title>Measuring the anisotropic thermal diffusivity of silicon nitride grains by thermoreflectance microscopy</title><title>Journal of the European Ceramic Society</title><description>High-resolution thermoreflectance microscopy measurements were performed at five frequencies on rod-shaped Si
3N
4 grains in a ceramic. Our heat diffusion model takes account of the coating and of a coating/substrate resistance. The parameters are adjusted to fit the measurements at the five frequencies simultaneously. The principal diffusivities obtained in individual grains are 0·32
cm
2
s
−1 along the
a-axis, and 0·84
cm
2
s
−1 along the
c-axis (corresponding conductivities: 69 and 180
W
m
−1
K
−1). The thermal anisotropy inside individual Si
3N
4 grains is found to be intrinsic, without direct connection with their elongated shape. ‘Macroscopic’ diffusivities, obtained by mirage effect, are different from the values measured inside individual grains, as a consequence of the dispersion of the grains' orientations in the ceramic and of a second-phase effect.</description><subject>Applied sciences</subject><subject>Building materials. Ceramics. Glasses</subject><subject>Ceramic industries</subject><subject>Chemical industry and chemicals</subject><subject>Exact sciences and technology</subject><subject>General studies</subject><subject>non-destructive evaluation</subject><subject>photoreflectance microscopy</subject><subject>Si 3N 4</subject><subject>Technical ceramics</subject><subject>thermal conductivity</subject><issn>0955-2219</issn><issn>1873-619X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1999</creationdate><recordtype>article</recordtype><recordid>eNqFkMtKBDEQRYMoOD4-QchCRBetqX4mK5HBFyguVHAXMunKWNLTGZNuYf7e7hnRpbUpCu6tunUYOwJxDgLKi2ehiiJJU1CnSp4JkRYygS02AVllSQnqbZtNfiW7bC_GDyGgEkpN2PwRTewDtXPevSM3LUXfBb8kO85hYRpek3N9pC_qVtw7Hqkh61veUheoRj4PhtrIZ6uNwQd0DdrOtBb5gmzw0frl6oDtONNEPPzp--z15vplepc8PN3eT68eEpvLokty5yo3K4TEqsoQZVpXUjkLLq_BzlIlFNSlrVOw0hpUMBNDocqzDLBCKLN9drLZuwz-s8fY6QVFi01jWvR91Gkl8rSU-SAsNsIxYRxC62WghQkrDUKPWPUaqx6ZaSX1GquGwXf8c8BEaxoXhkcp_pllplQx5rjcyHB49osw6GgJByY1hYGOrj39c-gbIc-PDA</recordid><startdate>19990101</startdate><enddate>19990101</enddate><creator>Li, Bincheng</creator><creator>Pottier, L.</creator><creator>Roger, J.P.</creator><creator>Fournier, D.</creator><creator>Watari, K.</creator><creator>Hirao, K.</creator><general>Elsevier Ltd</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19990101</creationdate><title>Measuring the anisotropic thermal diffusivity of silicon nitride grains by thermoreflectance microscopy</title><author>Li, Bincheng ; Pottier, L. ; Roger, J.P. ; Fournier, D. ; Watari, K. ; Hirao, K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c485t-4ff7fb508e773ee82d789fc1f4d1cb29091d6cd21c8cae91b0000e94331e7e163</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1999</creationdate><topic>Applied sciences</topic><topic>Building materials. Ceramics. Glasses</topic><topic>Ceramic industries</topic><topic>Chemical industry and chemicals</topic><topic>Exact sciences and technology</topic><topic>General studies</topic><topic>non-destructive evaluation</topic><topic>photoreflectance microscopy</topic><topic>Si 3N 4</topic><topic>Technical ceramics</topic><topic>thermal conductivity</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Li, Bincheng</creatorcontrib><creatorcontrib>Pottier, L.</creatorcontrib><creatorcontrib>Roger, J.P.</creatorcontrib><creatorcontrib>Fournier, D.</creatorcontrib><creatorcontrib>Watari, K.</creatorcontrib><creatorcontrib>Hirao, K.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of the European Ceramic Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Li, Bincheng</au><au>Pottier, L.</au><au>Roger, J.P.</au><au>Fournier, D.</au><au>Watari, K.</au><au>Hirao, K.</au><au>WCA</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Measuring the anisotropic thermal diffusivity of silicon nitride grains by thermoreflectance microscopy</atitle><jtitle>Journal of the European Ceramic Society</jtitle><date>1999-01-01</date><risdate>1999</risdate><volume>19</volume><issue>8</issue><spage>1631</spage><epage>1639</epage><pages>1631-1639</pages><issn>0955-2219</issn><eissn>1873-619X</eissn><abstract>High-resolution thermoreflectance microscopy measurements were performed at five frequencies on rod-shaped Si
3N
4 grains in a ceramic. Our heat diffusion model takes account of the coating and of a coating/substrate resistance. The parameters are adjusted to fit the measurements at the five frequencies simultaneously. The principal diffusivities obtained in individual grains are 0·32
cm
2
s
−1 along the
a-axis, and 0·84
cm
2
s
−1 along the
c-axis (corresponding conductivities: 69 and 180
W
m
−1
K
−1). The thermal anisotropy inside individual Si
3N
4 grains is found to be intrinsic, without direct connection with their elongated shape. ‘Macroscopic’ diffusivities, obtained by mirage effect, are different from the values measured inside individual grains, as a consequence of the dispersion of the grains' orientations in the ceramic and of a second-phase effect.</abstract><cop>Oxford</cop><pub>Elsevier Ltd</pub><doi>10.1016/S0955-2219(98)00258-1</doi><tpages>9</tpages></addata></record> |
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language | eng |
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source | Elsevier ScienceDirect Journals |
subjects | Applied sciences Building materials. Ceramics. Glasses Ceramic industries Chemical industry and chemicals Exact sciences and technology General studies non-destructive evaluation photoreflectance microscopy Si 3N 4 Technical ceramics thermal conductivity |
title | Measuring the anisotropic thermal diffusivity of silicon nitride grains by thermoreflectance microscopy |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-07T18%3A49%3A47IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Measuring%20the%20anisotropic%20thermal%20diffusivity%20of%20silicon%20nitride%20grains%20by%20thermoreflectance%20microscopy&rft.jtitle=Journal%20of%20the%20European%20Ceramic%20Society&rft.au=Li,%20Bincheng&rft.date=1999-01-01&rft.volume=19&rft.issue=8&rft.spage=1631&rft.epage=1639&rft.pages=1631-1639&rft.issn=0955-2219&rft.eissn=1873-619X&rft_id=info:doi/10.1016/S0955-2219(98)00258-1&rft_dat=%3Cproquest_cross%3E27042684%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=27042684&rft_id=info:pmid/&rft_els_id=S0955221998002581&rfr_iscdi=true |