Measuring the anisotropic thermal diffusivity of silicon nitride grains by thermoreflectance microscopy
High-resolution thermoreflectance microscopy measurements were performed at five frequencies on rod-shaped Si 3N 4 grains in a ceramic. Our heat diffusion model takes account of the coating and of a coating/substrate resistance. The parameters are adjusted to fit the measurements at the five frequen...
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Veröffentlicht in: | Journal of the European Ceramic Society 1999-01, Vol.19 (8), p.1631-1639 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | High-resolution thermoreflectance microscopy measurements were performed at five frequencies on rod-shaped Si
3N
4 grains in a ceramic. Our heat diffusion model takes account of the coating and of a coating/substrate resistance. The parameters are adjusted to fit the measurements at the five frequencies simultaneously. The principal diffusivities obtained in individual grains are 0·32
cm
2
s
−1 along the
a-axis, and 0·84
cm
2
s
−1 along the
c-axis (corresponding conductivities: 69 and 180
W
m
−1
K
−1). The thermal anisotropy inside individual Si
3N
4 grains is found to be intrinsic, without direct connection with their elongated shape. ‘Macroscopic’ diffusivities, obtained by mirage effect, are different from the values measured inside individual grains, as a consequence of the dispersion of the grains' orientations in the ceramic and of a second-phase effect. |
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ISSN: | 0955-2219 1873-619X |
DOI: | 10.1016/S0955-2219(98)00258-1 |