Synthesis and Surface Acoustic Wave Property of Aluminum Nitride Thin Films Fabricated on Silicon and Diamond Substrates Using the Sputtering Method
C -axis oriented aluminum nitride (AlN) thin films with a thickness of 1 µm were prepared by reactive DC magnetron sputtering on polycrystalline diamond substrates at a substrate temperature of 623 K. The average surface roughness ( R a ) of the AlN thin films was less than 2 nm obtained by locating...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2001, Vol.40 (8R), p.5065-5068 |
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Hauptverfasser: | , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | C
-axis oriented aluminum nitride (AlN) thin films with a thickness of 1 µm were prepared by reactive DC magnetron sputtering on polycrystalline diamond substrates at a substrate temperature of 623 K. The average surface roughness (
R
a
) of the AlN thin films was less than 2 nm obtained by locating the diamond substrates at a position of 100 mm from the aluminum target. The full width at half maximum (FWHM) of the rocking curve for the AlN(002) peak determined by X-ray diffraction analysis was about 0.2°. The surface acoustic wave (SAW) structures were completed by the deposition of aluminum electrodes on the as-deposited AlN surfaces. The SAW characteristics of an interdigital transducer (IDT)/AlN/diamond structure were investigated. The phase velocity and coupling coefficient were 10,120 m/s and 0.3%, respectively. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.40.5065 |