Synthesis and Surface Acoustic Wave Property of Aluminum Nitride Thin Films Fabricated on Silicon and Diamond Substrates Using the Sputtering Method

C -axis oriented aluminum nitride (AlN) thin films with a thickness of 1 µm were prepared by reactive DC magnetron sputtering on polycrystalline diamond substrates at a substrate temperature of 623 K. The average surface roughness ( R a ) of the AlN thin films was less than 2 nm obtained by locating...

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Veröffentlicht in:Japanese Journal of Applied Physics 2001, Vol.40 (8R), p.5065-5068
Hauptverfasser: Ishihara, Masatou, Manabe, Takaaki, Kumagai, Toshiya, Nakamura, Takako, Fujiwara, Syuzo, Ebata, Yasuo, Shikata, Shin-ichi, Nakahata, Hideaki, Hachigo, Akihiro, Koga, Yoshinori
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Sprache:eng
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Zusammenfassung:C -axis oriented aluminum nitride (AlN) thin films with a thickness of 1 µm were prepared by reactive DC magnetron sputtering on polycrystalline diamond substrates at a substrate temperature of 623 K. The average surface roughness ( R a ) of the AlN thin films was less than 2 nm obtained by locating the diamond substrates at a position of 100 mm from the aluminum target. The full width at half maximum (FWHM) of the rocking curve for the AlN(002) peak determined by X-ray diffraction analysis was about 0.2°. The surface acoustic wave (SAW) structures were completed by the deposition of aluminum electrodes on the as-deposited AlN surfaces. The SAW characteristics of an interdigital transducer (IDT)/AlN/diamond structure were investigated. The phase velocity and coupling coefficient were 10,120 m/s and 0.3%, respectively.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.40.5065