Modelling of pulsed laser deposition of large area films

A novel technique for the deposition of thin films by pulsed laser deposition over large substrate areas has been modelled. It is shown that by rastering the ablation plume across the substrate as well as rotating the substrate, larger areas can be covered more uniformly than has been possible by previously reported methods. Calculations demonstrate that film thickness values with only a ±0.5% variation over substrates as large as 100 mm in diameter could be produced by this method. These results compare favourably with other deposition techniques.