Vacuum-Driven Orientation of Nanostructured Diblock Copolymer Thin Films

This work aims to demonstrate a facile method for the controlled orientation of nanostructures of block copolymer (BCP) thin films. A simple diblock copolymer system, polystyrene-block-polydimethylsiloxane (PS-b-PDMS), is chosen to demonstrate vacuum-driven orientation for solving the notorious low-...

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Veröffentlicht in:ACS nano 2022-08, Vol.16 (8), p.12686-12694
Hauptverfasser: Panda, Aum Sagar, Lee, Yi-Chien, Hung, Chen-Jung, Liu, Kang-Ping, Chang, Cheng-Yen, Manesi, Gkreti-Maria, Avgeropoulos, Apostolos, Tseng, Fan-Gang, Chen, Fu-Rong, Ho, Rong-Ming
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Sprache:eng
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Zusammenfassung:This work aims to demonstrate a facile method for the controlled orientation of nanostructures of block copolymer (BCP) thin films. A simple diblock copolymer system, polystyrene-block-polydimethylsiloxane (PS-b-PDMS), is chosen to demonstrate vacuum-driven orientation for solving the notorious low-surface-energy problem of silicon-based BCP nanopatterning. By taking advantage of the pressure dependence of the surface tension of polymeric materials, a neutral air surface for the PS-b-PDMS thin film can be formed under a high vacuum degree (∼10–4 Pa), allowing the formation of the film-spanning perpendicular cylinders and lamellae upon thermal annealing. In contrast to perpendicular lamellae, a long-range lateral order for forming perpendicular cylinders can be efficiently achieved through the self-alignment mechanism for induced ordering from the top and bottom of the free-standing thin film.
ISSN:1936-0851
1936-086X
DOI:10.1021/acsnano.2c04368