Effectiveness of metallic mirror for promoting the photoresponse of InGaAs PIN photodiode
The effectiveness of metallic mirror for raising the photoresponse of vertical-illuminated InGaAs PIN photodiode was calculated and experimentally verified. The preliminary results show that an InGaAs PIN photodiode with a 1-μm absorption layer and Ti/Pt/Au backside metallization can reach a respons...
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Veröffentlicht in: | Solid-state electronics 1999, Vol.43 (5), p.961-967 |
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Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | The effectiveness of metallic mirror for raising the photoresponse of vertical-illuminated InGaAs PIN photodiode was calculated and experimentally verified. The preliminary results show that an InGaAs PIN photodiode with a 1-μm absorption layer and Ti/Pt/Au backside metallization can reach a responsivity of ∼0.8 A/W or a quantum efficiency of ∼76% at 1.3 μm wavelength. Such values indicate that the incident light travels the absorption region more than 1 μm and in turn provide the evidence for light reflection. From the comparison with the calculated responsivity spectra, the reflectivity of Ti/Pt/Au can be derived with a value of ∼0.4, which agrees reasonably well with the calculated metallic reflectivity. |
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ISSN: | 0038-1101 1879-2405 |
DOI: | 10.1016/S0038-1101(98)00340-2 |