Direct extraction of semiconductor device parameters using lateral optimization method

The efficiency and robustness of the widely used vertical optimization and the present lateral optimization methods are compared under the environment of an industry standard statistical language called S-plus. Using a junction diode as an example, it is shown that the direct lateral optimization is...

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Veröffentlicht in:Solid-state electronics 1999, Vol.43 (4), p.845-848
Hauptverfasser: Ortiz-Conde, A, Ma, Yuansheng, Thomson, J, Santos, E, Liou, J.J, Garcı́a Sánchez, F.J, Lei, M, Finol, J, Layman, P
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container_end_page 848
container_issue 4
container_start_page 845
container_title Solid-state electronics
container_volume 43
creator Ortiz-Conde, A
Ma, Yuansheng
Thomson, J
Santos, E
Liou, J.J
Garcı́a Sánchez, F.J
Lei, M
Finol, J
Layman, P
description The efficiency and robustness of the widely used vertical optimization and the present lateral optimization methods are compared under the environment of an industry standard statistical language called S-plus. Using a junction diode as an example, it is shown that the direct lateral optimization is an accurate, efficient, and robust method for extracting semiconductor device parameters. The widely used direct vertical optimization method has the same degree of accuracy and robustness, but the disadvantage of being much less efficient.
doi_str_mv 10.1016/S0038-1101(99)00044-1
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title Direct extraction of semiconductor device parameters using lateral optimization method
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