Fabrication of self-standing, size-adjustable nickel structures with nanometer resolution

Silicon micromachining is an attractive technique for a wide class of miniaturised components and systems. We have designed and fabricated several self-standing devices based on surface and bulk micromachining techniques. Our process makes use of Silicon Nitride membranes, which are patterned by electron beam (e-beam) lithography and removed after pattern metallization by reactive ion etching. The fabricated microstructures can be moved and adjusted by electromagnetic actuation.