CMOS/SOI technologies for low-power and low-voltage circuits

This paper provides the fundamental basis for adressing current and future CMOS/SOI technologies, which will be mainly dedicated to low-voltage and low-power applications. This review focuses on SOI substrates fabrication, SOI devices (fully-depleted, partially-depleted, DTMOS) and their electrical...

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Veröffentlicht in:Microelectronic engineering 1999, Vol.48 (1), p.327-334
Hauptverfasser: Pelloie, J.L., Raynaud, C., Faynot, O., Grouillet, A., Du Port de Pontcharra, J.
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Sprache:eng
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Zusammenfassung:This paper provides the fundamental basis for adressing current and future CMOS/SOI technologies, which will be mainly dedicated to low-voltage and low-power applications. This review focuses on SOI substrates fabrication, SOI devices (fully-depleted, partially-depleted, DTMOS) and their electrical behavior, and SOI transistor modeling.
ISSN:0167-9317
1873-5568
DOI:10.1016/S0167-9317(99)00398-6