Optical properties of CrO/ZrO optical superlattice for attenuated phase shifting mask at 193 nm wavelength
CrO/ZrO optical superlattices composed of ten film stacks with ∼9 nm thickness in each stack are obtained in a duel-gun rf magnetic sputtering system. By controlling the thickness percentage of ZrO in a CrO/ZrO stack and the flow-rate ratio of O 2/Ar, the optical requirements for optical superlattic...
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Veröffentlicht in: | Microelectronic engineering 2001-09, Vol.57, p.439-445 |
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Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | CrO/ZrO optical superlattices composed of ten film stacks with ∼9 nm thickness in each stack are obtained in a duel-gun rf magnetic sputtering system. By controlling the thickness percentage of ZrO in a CrO/ZrO stack and the flow-rate ratio of O
2/Ar, the optical requirements for optical superlattices being used as APSM blanks can be met. The dielectric constants of CrO/ZrO optical superlattices are shown to fit the effective medium approximation, and the calculated transmittance, reflectance and total film thickness of CrO/ZrO optical superlattices may thus serve as π-phase shifters. |
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ISSN: | 0167-9317 1873-5568 |
DOI: | 10.1016/S0167-9317(01)00464-6 |