Optical properties of CrO/ZrO optical superlattice for attenuated phase shifting mask at 193 nm wavelength

CrO/ZrO optical superlattices composed of ten film stacks with ∼9 nm thickness in each stack are obtained in a duel-gun rf magnetic sputtering system. By controlling the thickness percentage of ZrO in a CrO/ZrO stack and the flow-rate ratio of O 2/Ar, the optical requirements for optical superlattic...

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Veröffentlicht in:Microelectronic engineering 2001-09, Vol.57, p.439-445
Hauptverfasser: Lai, F.D., Wang, L.A.
Format: Artikel
Sprache:eng
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Zusammenfassung:CrO/ZrO optical superlattices composed of ten film stacks with ∼9 nm thickness in each stack are obtained in a duel-gun rf magnetic sputtering system. By controlling the thickness percentage of ZrO in a CrO/ZrO stack and the flow-rate ratio of O 2/Ar, the optical requirements for optical superlattices being used as APSM blanks can be met. The dielectric constants of CrO/ZrO optical superlattices are shown to fit the effective medium approximation, and the calculated transmittance, reflectance and total film thickness of CrO/ZrO optical superlattices may thus serve as π-phase shifters.
ISSN:0167-9317
1873-5568
DOI:10.1016/S0167-9317(01)00464-6