Bipolar model extension for MOS transistors considering gate coupling effects in the HBM ESD domain
The presented compact model for NMOS transistors combines both the high-current bipolar mode and the MOS mode considering modulation of the current gain β and gate coupling effects. For the studied 0.35 μm-CMOS devices, measurement and simulation correlate very well with respect to layout variations...
Gespeichert in:
Veröffentlicht in: | Microelectronics and reliability 1999-11, Vol.39 (11), p.1541-1549 |
---|---|
Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The presented compact model for NMOS transistors combines both the high-current bipolar mode and the MOS mode considering modulation of the current gain
β and gate coupling effects. For the studied 0.35 μm-CMOS devices, measurement and simulation correlate very well with respect to layout variations, fulfilling a prerequisite for the simulation guided synthesis and optimization of ESD protection structures and schemes. The open model interface also allows the use of existing proprietary MOS-models. |
---|---|
ISSN: | 0026-2714 1872-941X |
DOI: | 10.1016/S0026-2714(99)00074-8 |