The influence of plasma composition on the quality of spray-deposited nickel aluminide foils

Thin foils of IC-50 were produced using both Ar/H sub 2 and Ar/He gas mixtures in an RF induction coupled plasma. Foils produced wth the Ar/H sub 2 plasma were brittle due to a high pickup of hydrogen during deposition. These foils also had a poor surface quality due to the widespread distribution o...

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Veröffentlicht in:	Scripta materialia 1998-06, Vol.39 (2), p.139-145
Hauptverfasser:	Hammond, V.H., Elzey, D.M., Wawner, F.E.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Cross-disciplinary physics: materials science rheology Exact sciences and technology Ion and electron beam-assisted deposition ion plating Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics
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Zusammenfassung:	Thin foils of IC-50 were produced using both Ar/H sub 2 and Ar/He gas mixtures in an RF induction coupled plasma. Foils produced wth the Ar/H sub 2 plasma were brittle due to a high pickup of hydrogen during deposition. These foils also had a poor surface quality due to the widespread distribution of small micron-sized particles present on the foil surface. The formation of these particles is attributed to vapor phase nucleation/condensation. Switching to a lower enthalpy (Ar/He)plasma resulted in a foil with improved ductility and no surface residue.
ISSN:	1359-6462 1872-8456
DOI:	10.1016/S1359-6462(98)00156-0