Systems control for a micro-stereolithography prototype
The system control of a micro-stereolithographic fabrication system is detailed, with specific attention given to the opto-electronic and electro-mechanical interfaces. The application of the National Instrument LabVEIW© environment is demonstrated to provide a good basis for rapid application devel...
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| Veröffentlicht in: | Microprocessors and microsystems 1998-06, Vol.22 (2), p.67-77 |
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| container_end_page | 77 |
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| container_issue | 2 |
| container_start_page | 67 |
| container_title | Microprocessors and microsystems |
| container_volume | 22 |
| creator | Huang, S Heywood, M.I Young, R.C.D Farsari, M Chatwin, C.R |
| description | The system control of a micro-stereolithographic fabrication system is detailed, with specific attention given to the opto-electronic and electro-mechanical interfaces. The application of the National Instrument LabVEIW© environment is demonstrated to provide a good basis for rapid application development of the necessary control structures. In particular, this provides the basis for a highly flexible control system, typical activities of which include: low-level interface formats; icon-based systems design; and support for good human–computer interfacing. The resulting system has the capability to provide two orders of magnitude improvement above that currently available. |
| doi_str_mv | 10.1016/S0141-9331(98)00070-2 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0141-9331 |
| ispartof | Microprocessors and microsystems, 1998-06, Vol.22 (2), p.67-77 |
| issn | 0141-9331 1872-9436 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_26814654 |
| source | Elsevier ScienceDirect Journals Complete |
| subjects | Micro-stereolithography Rapid applications development Rapid prototyping Software systems control |
| title | Systems control for a micro-stereolithography prototype |
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