Systems control for a micro-stereolithography prototype

The system control of a micro-stereolithographic fabrication system is detailed, with specific attention given to the opto-electronic and electro-mechanical interfaces. The application of the National Instrument LabVEIW© environment is demonstrated to provide a good basis for rapid application development of the necessary control structures. In particular, this provides the basis for a highly flexible control system, typical activities of which include: low-level interface formats; icon-based systems design; and support for good human–computer interfacing. The resulting system has the capability to provide two orders of magnitude improvement above that currently available.