The use of reliability factors in analyzing powder patterns in Pt–Si sputtering targets and subsequent films
X-ray powder diffraction was used to characterize a Pt–Si sputtering target and subsequent films. The powder patterns of each sample indicated lines due to diffraction from different phases. We have initiated a preliminary study through which we have analyzed and characterized these films. The resul...
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Veröffentlicht in: | Journal of Materials Research 1998-06, Vol.13 (6), p.1517-1521 |
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container_title | Journal of Materials Research |
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creator | Rahman, Abdul Lowe, Walter P. Bates, Clayton W. |
description | X-ray powder diffraction was used to characterize a Pt–Si sputtering target and subsequent films. The powder patterns of each sample indicated lines due to diffraction from different phases. We have initiated a preliminary study through which we have analyzed and characterized these films. The results presented for these samples corroborate with results observed for this system in the planar configuration. |
doi_str_mv | 10.1557/JMR.1998.0211 |
format | Article |
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The powder patterns of each sample indicated lines due to diffraction from different phases. We have initiated a preliminary study through which we have analyzed and characterized these films. 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Mater. Res</addtitle><description>X-ray powder diffraction was used to characterize a Pt–Si sputtering target and subsequent films. The powder patterns of each sample indicated lines due to diffraction from different phases. We have initiated a preliminary study through which we have analyzed and characterized these films. The results presented for these samples corroborate with results observed for this system in the planar configuration.</description><subject>MATERIALS SCIENCE</subject><subject>PHASE STUDIES</subject><subject>PLATINUM SILICIDES</subject><subject>POWDERS</subject><subject>SPUTTERING</subject><subject>X-RAY DIFFRACTION</subject><issn>0884-2914</issn><issn>2044-5326</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1998</creationdate><recordtype>article</recordtype><recordid>eNp1kE1v1DAQhi0EEkvhyN1cuGVrJ_6Ij6ii5WOBLpSz5TiTrUvWST2OYDnxH_iH_BIStoITp5Fmnnln9BDylLM1l1Kfvnn3cc2Nqdes5PweWZVMiEJWpbpPVqyuRVEaLh6SR4g3jHHJtFiReHUNdEKgQ0cT9ME1oQ_5QDvn85CQhkhddP3he4g7Og5fW0h0dDlDin-Gl_nXj5-fAsVxWpoLlV3aQcZ5r6U4NQi3E8RMu9Dv8TF50Lke4cldPSGfz19enb0qNh8uXp-92BS-0iwXvHK1cQK40rySNa9BNK3oGmhYayQ4LbnpZFc1pW6UUNz4tlVl1bWlqo32ojohz465A-Zg0YcM_toPMYLPVlW1lgvz_MiMaZhfxGz3AT30vYswTGjnLM64KWewOII-DYgJOjumsHfpYDmzi3k7m7eLebuY_8cHzPDtL-zSF6t0paVVF1v7fltfbtT51r6d-dO7fLdvUmh3YG-GKc3a8T8XfgO5JpbZ</recordid><startdate>19980601</startdate><enddate>19980601</enddate><creator>Rahman, Abdul</creator><creator>Lowe, Walter P.</creator><creator>Bates, Clayton W.</creator><general>Cambridge University Press</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>OTOTI</scope></search><sort><creationdate>19980601</creationdate><title>The use of reliability factors in analyzing powder patterns in Pt–Si sputtering targets and subsequent films</title><author>Rahman, Abdul ; Lowe, Walter P. ; Bates, Clayton W.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c370t-13a89a4e167135818e4bd4fbeb0d95ea7519f5f3b27b64619cdd623fd26897c43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1998</creationdate><topic>MATERIALS SCIENCE</topic><topic>PHASE STUDIES</topic><topic>PLATINUM SILICIDES</topic><topic>POWDERS</topic><topic>SPUTTERING</topic><topic>X-RAY DIFFRACTION</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Rahman, Abdul</creatorcontrib><creatorcontrib>Lowe, Walter P.</creatorcontrib><creatorcontrib>Bates, Clayton W.</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>OSTI.GOV</collection><jtitle>Journal of Materials Research</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Rahman, Abdul</au><au>Lowe, Walter P.</au><au>Bates, Clayton W.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The use of reliability factors in analyzing powder patterns in Pt–Si sputtering targets and subsequent films</atitle><jtitle>Journal of Materials Research</jtitle><addtitle>J. Mater. Res</addtitle><date>1998-06-01</date><risdate>1998</risdate><volume>13</volume><issue>6</issue><spage>1517</spage><epage>1521</epage><pages>1517-1521</pages><issn>0884-2914</issn><eissn>2044-5326</eissn><abstract>X-ray powder diffraction was used to characterize a Pt–Si sputtering target and subsequent films. The powder patterns of each sample indicated lines due to diffraction from different phases. We have initiated a preliminary study through which we have analyzed and characterized these films. The results presented for these samples corroborate with results observed for this system in the planar configuration.</abstract><cop>New York, USA</cop><pub>Cambridge University Press</pub><doi>10.1557/JMR.1998.0211</doi><tpages>5</tpages></addata></record> |
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subjects | MATERIALS SCIENCE PHASE STUDIES PLATINUM SILICIDES POWDERS SPUTTERING X-RAY DIFFRACTION |
title | The use of reliability factors in analyzing powder patterns in Pt–Si sputtering targets and subsequent films |
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