LOW-TEMPERATURE CRYSTALLIZATION OF SOL-GEL DERIVED Pb(Zr0.4,Ti0.6)O3 THIN FILMS

Authors studied the crystallization of sol-gel derived Pb(Zr0.4Ti0.6)O3 [PZT(40/60)] thin films at 435 down to 420 C. The PZT(40/60) films were prepared at these temperatures on Pt/SiO2/Si substrates by a combination of diol-based solutions and modified film preparation processes. Various properties...

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Veröffentlicht in:Jpn.J.Appl.Phys ,Part 1. Vol. 40, no. 9B, pp. 5533-5538. 2001 Part 1. Vol. 40, no. 9B, pp. 5533-5538. 2001, 2001, Vol.40 (9B), p.5533-5538
Hauptverfasser: Maki, K, Soyama, N, Nagamine, K, Mori, S, Ogi, K
Format: Artikel
Sprache:eng
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Zusammenfassung:Authors studied the crystallization of sol-gel derived Pb(Zr0.4Ti0.6)O3 [PZT(40/60)] thin films at 435 down to 420 C. The PZT(40/60) films were prepared at these temperatures on Pt/SiO2/Si substrates by a combination of diol-based solutions and modified film preparation processes. Various properties of the PZT(40/60) films, such as microstructures, crystal orientation, ferroelectric properties, relative permittivity, and leakage current density were evaluated. PZT(40/60) films could be crystallized at 435 to 420 C by the diol-based solutions and the modified film preparation processes. The PZT(40/60) films had microstructures with perovskite-single-phase fine columnar grains and good electric characteristics, such as remanent polarization of 12 to 15 mu C/cm2, relative permittivity of 780, and breakdown voltage of > 10 V. 12 refs.
ISSN:0021-4922
DOI:10.1143/JJAP.40.5533