Surface characterization of oriented silver films on Si (100) substrates using scanning tunnelling microscopy

The morphology of silver films grown at 300°C in high vacuum have been characterized. The films consist of highly ordered (100) oriented grains exhibiting large flat terraces with array of parallel steps. The surface roughness of the individual grains was characterized by scanning tunnelling microsc...

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Veröffentlicht in:	Thin solid films 1998-06, Vol.323 (1), p.105-109
Hauptverfasser:	Ali, A.O, Kshirsagar, R.B, Dharmadhikari, C.V
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Metals. Metallurgy Oriented silver films Physics Scanning tunnelling microscopy Si substrates Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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Zusammenfassung:	The morphology of silver films grown at 300°C in high vacuum have been characterized. The films consist of highly ordered (100) oriented grains exhibiting large flat terraces with array of parallel steps. The surface roughness of the individual grains was characterized by scanning tunnelling microscopy (STM) in terms of height histograms and height–height correlations. The results are discussed in the context of applications of these films as templates for the investigation of complex molecules.
ISSN:	0040-6090 1879-2731
DOI:	10.1016/S0040-6090(97)01042-0