AlGaN/GaN Round-HEMTs on (111) silicon substrates

AlGaN/GaN Round-HEMTs on silicon substrates have been realised and their static charcteristics investigated. The AlGaN/GaN (x = 0.23) material structures were grown on (111) p-Si by LP-MOVPE. Devices with 0.3 mu m gate length exhibit a saturation current of 0.82 A/mm, a good pinch-off and a peak ext...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Electronics letters 2001-10, Vol.37 (22), p.1364-1366
Hauptverfasser: Javorka, P., Alam, A., Nastase, N., Marso, M., Hardtdegen, H., Heuken, M., Lüth, H., Kordoš, P.
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:AlGaN/GaN Round-HEMTs on silicon substrates have been realised and their static charcteristics investigated. The AlGaN/GaN (x = 0.23) material structures were grown on (111) p-Si by LP-MOVPE. Devices with 0.3 mu m gate length exhibit a saturation current of 0.82 A/mm, a good pinch-off and a peak extrinsic transconductance of 110 mS /mm. Highest saturation current reported so far and static output characteristics up to 20 V demonstrate that the devices are capable of handling 16 W/mm of static heat dissipation without any degradation of their performance.
ISSN:0013-5194
1350-911X
DOI:10.1049/el:20010926