AlGaN/GaN Round-HEMTs on (111) silicon substrates
AlGaN/GaN Round-HEMTs on silicon substrates have been realised and their static charcteristics investigated. The AlGaN/GaN (x = 0.23) material structures were grown on (111) p-Si by LP-MOVPE. Devices with 0.3 mu m gate length exhibit a saturation current of 0.82 A/mm, a good pinch-off and a peak ext...
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Veröffentlicht in: | Electronics letters 2001-10, Vol.37 (22), p.1364-1366 |
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Hauptverfasser: | , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | AlGaN/GaN Round-HEMTs on silicon substrates have been realised and their static charcteristics investigated. The AlGaN/GaN (x = 0.23) material structures were grown on (111) p-Si by LP-MOVPE. Devices with 0.3 mu m gate length exhibit a saturation current of 0.82 A/mm, a good pinch-off and a peak extrinsic transconductance of 110 mS /mm. Highest saturation current reported so far and static output characteristics up to 20 V demonstrate that the devices are capable of handling 16 W/mm of static heat dissipation without any degradation of their performance. |
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ISSN: | 0013-5194 1350-911X |
DOI: | 10.1049/el:20010926 |