Electrochemical and structural properties of radio frequency sputtered cobalt oxide electrodes for thin-film supercapacitors
The electrochemical and structural properties of cobalt oxide films which are deposited at different sputtering gas-ratios of O 2/(Ar+O 2) are investigated. In order to examine the electrochemical properties of the as-deposited films, all solid-state thin-film supercapacitors (TFSCs) are fabricated....
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Veröffentlicht in: | Journal of power sources 2001-12, Vol.102 (1), p.167-171 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The electrochemical and structural properties of cobalt oxide films which are deposited at different sputtering gas-ratios of O
2/(Ar+O
2) are investigated. In order to examine the electrochemical properties of the as-deposited films, all solid-state thin-film supercapacitors (TFSCs) are fabricated. There consist of Co
3O
4 electrodes and an amorphous LiPON thin-film electrolyte. It is shown that the capacitance behaviour of the Co
3O
4/LiPON/Co
3O
4 TFSCs is similar to bulk-type supercapacitor behaviour. It is further shown that the electrochemical behaviour of the TFSCs is dependent on the sputtering gas-ratios. The gas-ratio dependence of the capacitance of the oxide electrode films is discussed based on X-ray diffraction (XRD) and electrical results for the Co
3O
4 films. |
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ISSN: | 0378-7753 1873-2755 |
DOI: | 10.1016/S0378-7753(01)00864-3 |