Effect of water incorporation on the diffusion of sodium in Type I silica glass

The diffusion of sodium ions in Type I silica glass was studied experimentally by using Na-22 as a radioactive tracer at temperatures between 400°C and 700°C. It was found that the sodium tracer diffusion coefficient in as-received glass was well described by an Arrhenius equation. All residual radi...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of non-crystalline solids 2001-07, Vol.286 (3), p.146-161
Hauptverfasser: Tian, Lei, Dieckmann, Rüdiger, Hui, Chung-Yuen, Lin, Yu-Yun, Couillard, J.Greg
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The diffusion of sodium ions in Type I silica glass was studied experimentally by using Na-22 as a radioactive tracer at temperatures between 400°C and 700°C. It was found that the sodium tracer diffusion coefficient in as-received glass was well described by an Arrhenius equation. All residual radioactivity profiles observed after pre-annealing glass samples in common and wet air at temperatures between 900°C and 1100°C and performing diffusion anneals at 650°C cannot be described by a single diffusion coefficient. A strong residual radioactivity decrease occurred near the surface, which was followed by a much smaller decrease in the bulk below. This type of profile was attributed to the generation of a near-surface region with a reduced sodium mobility during the pre-annealing. A mathematical model for the analysis of the observed profiles was developed and used to determine sodium tracer diffusion coefficients in the near-surface region and in the bulk. It was found that the sodium tracer diffusion coefficient in the near-surface region was by about two orders of magnitude smaller than that in the bulk. This immobilization of Na is believed to be due to a water-induced structural relaxation in the near-surface region during pre-annealing.
ISSN:0022-3093
1873-4812
DOI:10.1016/S0022-3093(01)00520-8