Oxidative Addition of Silicon–Chloride Bonds to a Zerovalent Ruthenium Center and Direct Generation of an Ethylene Insertion Complex

The oxidative addition of a silicon–chloride (Si–Cl) bond to a metal center can be a key reaction step in coordinative silicon chemistry, but this reaction is seldom observed. Herein, we report direct oxidative addition of the Si–Cl bonds of dimethyldichlorosilane (Me2SiCl2) and cyclotrimethylenedic...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Inorganic chemistry 2022-06, Vol.61 (23), p.8639-8643
Hauptverfasser: Yoo, Hyojong, Berry, Donald H.
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The oxidative addition of a silicon–chloride (Si–Cl) bond to a metal center can be a key reaction step in coordinative silicon chemistry, but this reaction is seldom observed. Herein, we report direct oxidative addition of the Si–Cl bonds of dimethyldichlorosilane (Me2SiCl2) and cyclotrimethylenedichlorosilane [(CH2)3SiCl2] to low-valent ruthenium complexes, yielding the 16e– chloro­(organosilyl)­ruthenium complexes [N3]­Ru­(Cl)­(SiMe2Cl) (4a) and [N3]­Ru­(Cl)­(SiCl­(CH2)3) (4b) ([N3] = 2,6-(MesNCMe)2C5H3N; Mes = 1,3,5-trimethylphenyl; Me = methyl). The reversible reaction of 4a with ethylene yields an 18e– ethylene adduct, in which an ethylene is subsequently inserted into a ruthenium–silicon (Ru–Si) bond to produce the 16e– complex [N3]­Ru­(Cl)­(CH2CH2SiMe2Cl) (7). This study provides a good example of the direct generation of an ethylene insertion product, which is an important intermediate in the catalytic reduction of unsaturated molecules.
ISSN:0020-1669
1520-510X
DOI:10.1021/acs.inorgchem.2c01317