Characterisation of the generation of ions in electron beam evaporator for the control of metal deposition processes

By means of a specially designed ion detector, the dependence of ion current at the substrate on the electron emission current of the e-gun and bias-potential for the evaporation of Ti, Al, and Cr is investigated. It is illustrated by distinction of morphology of metal films, that the control of the parameters of bombarding ions can be a key for the control of the ion-assisted electron beam physical vapour deposition (EB-PVD) process.