Microbridge plasma display panel with high gas pressure

A microbridge structure based on air bridge technology has been used to make plasma display panels. This microbridge structure has a 20-/spl mu/m physical gap between the bridge anode and the cathode. The Paschen's minimum for pulsed dc discharges is around 900 Torr for Ne+0.1% Ar and He+Xe gas...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on electron devices 1998-06, Vol.45 (6), p.1356-1360
Hauptverfasser: Kyung Cheol Choi, Saville, G.F., Lee, S.C.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A microbridge structure based on air bridge technology has been used to make plasma display panels. This microbridge structure has a 20-/spl mu/m physical gap between the bridge anode and the cathode. The Paschen's minimum for pulsed dc discharges is around 900 Torr for Ne+0.1% Ar and He+Xe gas mixtures, and moves to higher pressures with increasing xenon content. The current-voltage (I-V) characteristics have been investigated over the pressure range of 500-900 Torr. With the pressure between 700 and 900 Torr the microbridge plasma display cells operate in a normal glow discharge mode. The luminance has been measured in a display panel consisting of a microbridge discharge structure combined with an R, G, B photoluminescent phosphor plate. He+Xe mixture discharges in this microbridge plasma display have their maximum luminance at 700-900 Torr.
ISSN:0018-9383
1557-9646
DOI:10.1109/16.678576