Extendibility of ultra long throw Ti-barriers passivated in nitrogen

Extendibility of ultra long throw Ti-barriers passivated in nitrogen

This study involves evaluation of a Ti liner deposited by long throw (i.e. Hi-fill ® and ULTRA) and comparison of different cooling regimes using Ar and N 2 as atmosphere in the case of ULTRA. The use of N 2-based cooling led to a surface passivation against oxidation. Therefore the effective Ti-thi...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Microelectronic engineering 2000-12, Vol.54 (3), p.223-228
Hauptverfasser: Schmidbauer, S, Urbansky, N, Claussen, W, Goergens, C, Ruf, A
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Barrier
Contact
Electronics
Exact sciences and technology
Liner
Long throw
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:This study involves evaluation of a Ti liner deposited by long throw (i.e. Hi-fill ® and ULTRA) and comparison of different cooling regimes using Ar and N 2 as atmosphere in the case of ULTRA. The use of N 2-based cooling led to a surface passivation against oxidation. Therefore the effective Ti-thickness could be reduced by a factor of 1.5. Surface analysis and electrical results are discussed within the paper.
ISSN:0167-9317
1873-5568
DOI:10.1016/S0167-9317(00)00415-9