TaC coatings prepared by hot filament chemical vapour deposition: characterization and properties

TaC coatings prepared by hot filament chemical vapour deposition: characterization and properties

Hot filament chemical vapour deposition has been used to prepare stable, adherent and stoichiometric tantalum carbide films. The films have been characterized using X-ray diffraction, Auger electron spectroscopy, X-ray photoelectron spectroscopy and scanning electron microscopy. Their microhardness...

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Veröffentlicht in:Thin solid films 1994-07, Vol.247 (1), p.34-38
Hauptverfasser: Dua, A.K., George, V.C.
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Exact sciences and technology
Metals. Metallurgy
Nonmetallic coatings
Production techniques
Surface treatment
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Beschreibung
Zusammenfassung:Hot filament chemical vapour deposition has been used to prepare stable, adherent and stoichiometric tantalum carbide films. The films have been characterized using X-ray diffraction, Auger electron spectroscopy, X-ray photoelectron spectroscopy and scanning electron microscopy. Their microhardness has been measured and their proton bombardment behaviour studied.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(94)90472-3