Mass Spectrometric Identification of Si-O-H(g) Species from the Reaction of Silica with Water Vapor at Atmospheric Pressure
A high‐pressure sampling mass spectrometer was used to detect the volatile species formed from SiO2 at temperatures between 1200° and 1400°C in a flowing water vapor/oxygen gas mixture at 1 bar total pressure. The primary vapor species identified was Si(OH)4. The fragment ion Si(OH)3+was observed in...
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Veröffentlicht in: | Journal of the American Ceramic Society 1997-04, Vol.80 (4), p.1009-1012 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A high‐pressure sampling mass spectrometer was used to detect the volatile species formed from SiO2 at temperatures between 1200° and 1400°C in a flowing water vapor/oxygen gas mixture at 1 bar total pressure. The primary vapor species identified was Si(OH)4. The fragment ion Si(OH)3+was observed in quantities 3 to 5 times larger than the parent ion Si(OH)4+. The Si(OH)3+ intensity was found to have a small temperature dependence and to increase with the water vapor partial pressure as expected. In addition, SiO(OH)+, believed to be a fragment of SiO(OH)2, was observed. These mass spectral results were compared to the behavior of silicon halides. |
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ISSN: | 0002-7820 1551-2916 |
DOI: | 10.1111/j.1151-2916.1997.tb02935.x |