Mass Spectrometric Identification of Si-O-H(g) Species from the Reaction of Silica with Water Vapor at Atmospheric Pressure

A high‐pressure sampling mass spectrometer was used to detect the volatile species formed from SiO2 at temperatures between 1200° and 1400°C in a flowing water vapor/oxygen gas mixture at 1 bar total pressure. The primary vapor species identified was Si(OH)4. The fragment ion Si(OH)3+was observed in...

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Veröffentlicht in:Journal of the American Ceramic Society 1997-04, Vol.80 (4), p.1009-1012
Hauptverfasser: Opila, Elizabeth J., Fox, Dennis S., Jacobson, Nathan S.
Format: Artikel
Sprache:eng
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Zusammenfassung:A high‐pressure sampling mass spectrometer was used to detect the volatile species formed from SiO2 at temperatures between 1200° and 1400°C in a flowing water vapor/oxygen gas mixture at 1 bar total pressure. The primary vapor species identified was Si(OH)4. The fragment ion Si(OH)3+was observed in quantities 3 to 5 times larger than the parent ion Si(OH)4+. The Si(OH)3+ intensity was found to have a small temperature dependence and to increase with the water vapor partial pressure as expected. In addition, SiO(OH)+, believed to be a fragment of SiO(OH)2, was observed. These mass spectral results were compared to the behavior of silicon halides.
ISSN:0002-7820
1551-2916
DOI:10.1111/j.1151-2916.1997.tb02935.x