Solid-state photochemistry of platinum(II) methylazide complexes as thin films on Si (111) surfaces : photolithography of platinum films

The solid-state photochemistry of L sub(2)Pt(Me)(N sub(3)) (L identical with PPh sub(3), PEt sub(3), dppe/2) have been investigated on Si (111) surfaces. Photolysis of an amorphous thin film of L sub(2)Pt(Me)(N sub(3)) results in the loss of all ligands. This occurs via a single photon process with...

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Veröffentlicht in:Journal of materials science 1994-04, Vol.29 (8), p.2143-2146
Hauptverfasser: BLAIR, S. L, HUTCHINS, J, HILL, R. H, BICKLEY, D. G
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Sprache:eng
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Zusammenfassung:The solid-state photochemistry of L sub(2)Pt(Me)(N sub(3)) (L identical with PPh sub(3), PEt sub(3), dppe/2) have been investigated on Si (111) surfaces. Photolysis of an amorphous thin film of L sub(2)Pt(Me)(N sub(3)) results in the loss of all ligands. This occurs via a single photon process with no detectable thermally stable intermediate. The resultant films are primarily platinum metal although some phosphine-containing impurity remains. The final analysis leads to formulations of the films as Pt(dppe) sub(0.06), Pt(PPh sub(3)) sub(0.12) and Pt(PEt sub(3)) sub(0.07). The thicknesses of the platinum films ranged from 150 nm to less than 25 nm. This process was shown to be compatible with standard lithography methods by the production of 3 mu m wires on Si (111) by photolithography.
ISSN:0022-2461
1573-4803
DOI:10.1007/bf01154692