Aerosol-assisted chemical vapor deposition (AACVD) of silver, palladium and metal alloy (Ag1−xPdx, Ag1−xCux and Pd1−xCux) Films

Thermally labile, low‐volatility molecules are usually unsuitable as precursors for the chemical vapor deposition of high‐quality metal films. Here, a new method, aerosol‐assisted CVD (see Fig.), is reported, and used to produce crystalline silver, palladium, and binary metal alloy thin films from j...

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Veröffentlicht in:	Advanced materials (Weinheim) 1994-10, Vol.6 (10), p.746-748
Hauptverfasser:	Xu, Chongying, Hampden-Smith, Mark J., Kodas, Toivo T.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics
Online-Zugang:	Volltext
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Beschreibung
Zusammenfassung:	Thermally labile, low‐volatility molecules are usually unsuitable as precursors for the chemical vapor deposition of high‐quality metal films. Here, a new method, aerosol‐assisted CVD (see Fig.), is reported, and used to produce crystalline silver, palladium, and binary metal alloy thin films from just such precursors.
ISSN:	0935-9648 1521-4095
DOI:	10.1002/adma.19940061005