Focused ion beams in microsystem fabrication

Focused ion beams in microsystem fabrication

Focused ion beam (FIB) systems are widely used in microelectronics for prototype modification, device failure analysis and process monitoring. With the growing importance of micro-electro-mechanical systems (MEMS) the question arises whether FIB can be successfully and economically applied to protot...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Microelectronic engineering 1997-02, Vol.35 (1-4), p.431-434
Hauptverfasser: Daniel, J.H., Moore, D.F., Walker, J.F., Whitney, J.T.
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Focused ion beam (FIB) systems are widely used in microelectronics for prototype modification, device failure analysis and process monitoring. With the growing importance of micro-electro-mechanical systems (MEMS) the question arises whether FIB can be successfully and economically applied to prototyping and production in that area.
ISSN:0167-9317
1873-5568
DOI:10.1016/S0167-9317(96)00128-1