The effect of thermal treatment on the structure, optical and electrical properties of amorphous titanium nitride thin films

The TiN thin films were deposited by reactive magnetron method. The structure and chemical composition of films were determined by X-ray, EDX and electron microscopy investigations. These studies indicate a complex structure of as-sputtered films. The films are composed of an amorphous matrix that i...

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Veröffentlicht in:	Thin solid films 1997-12, Vol.311 (1), p.93-100
Hauptverfasser:	Tarniowy, Adam, Mania, Ryszard, Rekas, Mieczyslaw
Format:	Artikel
Sprache:	eng
Schlagworte:	Amorphous materials Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition by sputtering Electrical properties and measurements Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport phenomena in thin films and low-dimensional structures Exact sciences and technology Low-field transport and mobility piezoresistance Materials science Methods of deposition of films and coatings film growth and epitaxy Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity) Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity Optical properties Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of bulk materials and thin films Physics Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology Titanium nitride
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Zusammenfassung:	The TiN thin films were deposited by reactive magnetron method. The structure and chemical composition of films were determined by X-ray, EDX and electron microscopy investigations. These studies indicate a complex structure of as-sputtered films. The films are composed of an amorphous matrix that includes nanocrystallites of TiN and Ti 2N. The amorphous as-sputtered films transform into crystalline films during thermal treatment above 673 K. Both electrical and optical properties of amorphous films differ substantially from those of crystalline films of the same chemical composition. Amorphous TiN films exhibit high electrical resistivity, high transmission of light in the visible range and a lack of metallic brilliance. The development of the structure models during thermal treatment has been proposed.
ISSN:	0040-6090 1879-2731
DOI:	10.1016/S0040-6090(97)00714-1