Dielectric filters made of PS: advanced performance by oxidation and new layer structures
For the formation of PS dielectric filters a detailed calibration of the etch rates and refractive indices is required. The effective dielectric function of PS was determined for different substrate doping levels as a function of the anodization current density by fitting reflectance spectra. Based...
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Veröffentlicht in: | Thin solid films 1997-04, Vol.297 (1), p.237-240 |
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creator | Berger, M.G Arens-Fischer, R Thönissen, M Krüger, M Billat, S Lüth, H Hilbrich, S Theiß, W Grosse, P |
description | For the formation of PS dielectric filters a detailed calibration of the etch rates and refractive indices is required. The effective dielectric function of PS was determined for different substrate doping levels as a function of the anodization current density by fitting reflectance spectra. Based on these results a number of different dielectric filters were realized. For device applications a thermal oxidation step is necessary to reduce aging effects which occur as a result of the native oxidation of PS. In addition, thermal oxidation results in a qualitatively improve filter performance due to a reduced absorption in the PS layers. Therefore the dielectric functions of PS oxidized in dry O
2 at temperatures up to 950
°C were determined. A continuous variation of the porosity and hence the refractive index with depth was used to realize so-called rugate filters. This type of interference filter allows the design of structures with more complex reflectance or transmittance characteristics than structures consisting of discrete single layers. © 1997 Elsevier Science S.A. |
doi_str_mv | 10.1016/S0040-6090(96)09361-3 |
format | Article |
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2 at temperatures up to 950
°C were determined. A continuous variation of the porosity and hence the refractive index with depth was used to realize so-called rugate filters. This type of interference filter allows the design of structures with more complex reflectance or transmittance characteristics than structures consisting of discrete single layers. © 1997 Elsevier Science S.A.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/S0040-6090(96)09361-3</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Oxidation ; PS layers ; Thermal oxidation</subject><ispartof>Thin solid films, 1997-04, Vol.297 (1), p.237-240</ispartof><rights>1997 Elsevier Science S.A.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c404t-cc55866c8c4f791e79bbbf4f152b7b130365275f068d656f3319048c0834e32c3</citedby><cites>FETCH-LOGICAL-c404t-cc55866c8c4f791e79bbbf4f152b7b130365275f068d656f3319048c0834e32c3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/S0040-6090(96)09361-3$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3536,27903,27904,45974</link.rule.ids></links><search><creatorcontrib>Berger, M.G</creatorcontrib><creatorcontrib>Arens-Fischer, R</creatorcontrib><creatorcontrib>Thönissen, M</creatorcontrib><creatorcontrib>Krüger, M</creatorcontrib><creatorcontrib>Billat, S</creatorcontrib><creatorcontrib>Lüth, H</creatorcontrib><creatorcontrib>Hilbrich, S</creatorcontrib><creatorcontrib>Theiß, W</creatorcontrib><creatorcontrib>Grosse, P</creatorcontrib><title>Dielectric filters made of PS: advanced performance by oxidation and new layer structures</title><title>Thin solid films</title><description>For the formation of PS dielectric filters a detailed calibration of the etch rates and refractive indices is required. The effective dielectric function of PS was determined for different substrate doping levels as a function of the anodization current density by fitting reflectance spectra. Based on these results a number of different dielectric filters were realized. For device applications a thermal oxidation step is necessary to reduce aging effects which occur as a result of the native oxidation of PS. In addition, thermal oxidation results in a qualitatively improve filter performance due to a reduced absorption in the PS layers. Therefore the dielectric functions of PS oxidized in dry O
2 at temperatures up to 950
°C were determined. A continuous variation of the porosity and hence the refractive index with depth was used to realize so-called rugate filters. This type of interference filter allows the design of structures with more complex reflectance or transmittance characteristics than structures consisting of discrete single layers. © 1997 Elsevier Science S.A.</description><subject>Oxidation</subject><subject>PS layers</subject><subject>Thermal oxidation</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1997</creationdate><recordtype>article</recordtype><recordid>eNqFkE1LxDAURYMoOI7-BCEr0UX1pWnS1I3I-AkDCqMLVyFNXyDSacekHZ1_b-uIW1ePC-deeIeQYwbnDJi8WABkkEgo4LSQZ1BwyRK-QyZM5UWS5pztkskfsk8OYnwHAJamfELebjzWaLvgLXW-7jBEujQV0tbR58UlNdXaNBYrusLg2rAcAy03tP3ylel821DTVLTBT1qbDQYau9Dbrg8YD8meM3XEo987Ja93ty-zh2T-dP84u54nNoOsS6wVQklplc1cXjDMi7IsXeaYSMu8ZBy4FGkuHEhVSSEd56yATFlQPEOeWj4lJ9vdVWg_eoydXvposa5Ng20fdSoFMJWpARRb0IY2xoBOr4JfmrDRDPQoUv-I1KMlXUj9I1LzoXe17eHwxdpj0NF6HKX4MJjTVev_WfgGhoZ6GQ</recordid><startdate>19970401</startdate><enddate>19970401</enddate><creator>Berger, M.G</creator><creator>Arens-Fischer, R</creator><creator>Thönissen, M</creator><creator>Krüger, M</creator><creator>Billat, S</creator><creator>Lüth, H</creator><creator>Hilbrich, S</creator><creator>Theiß, W</creator><creator>Grosse, P</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>19970401</creationdate><title>Dielectric filters made of PS: advanced performance by oxidation and new layer structures</title><author>Berger, M.G ; Arens-Fischer, R ; Thönissen, M ; Krüger, M ; Billat, S ; Lüth, H ; Hilbrich, S ; Theiß, W ; Grosse, P</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c404t-cc55866c8c4f791e79bbbf4f152b7b130365275f068d656f3319048c0834e32c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1997</creationdate><topic>Oxidation</topic><topic>PS layers</topic><topic>Thermal oxidation</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Berger, M.G</creatorcontrib><creatorcontrib>Arens-Fischer, R</creatorcontrib><creatorcontrib>Thönissen, M</creatorcontrib><creatorcontrib>Krüger, M</creatorcontrib><creatorcontrib>Billat, S</creatorcontrib><creatorcontrib>Lüth, H</creatorcontrib><creatorcontrib>Hilbrich, S</creatorcontrib><creatorcontrib>Theiß, W</creatorcontrib><creatorcontrib>Grosse, P</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Berger, M.G</au><au>Arens-Fischer, R</au><au>Thönissen, M</au><au>Krüger, M</au><au>Billat, S</au><au>Lüth, H</au><au>Hilbrich, S</au><au>Theiß, W</au><au>Grosse, P</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Dielectric filters made of PS: advanced performance by oxidation and new layer structures</atitle><jtitle>Thin solid films</jtitle><date>1997-04-01</date><risdate>1997</risdate><volume>297</volume><issue>1</issue><spage>237</spage><epage>240</epage><pages>237-240</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><abstract>For the formation of PS dielectric filters a detailed calibration of the etch rates and refractive indices is required. The effective dielectric function of PS was determined for different substrate doping levels as a function of the anodization current density by fitting reflectance spectra. Based on these results a number of different dielectric filters were realized. For device applications a thermal oxidation step is necessary to reduce aging effects which occur as a result of the native oxidation of PS. In addition, thermal oxidation results in a qualitatively improve filter performance due to a reduced absorption in the PS layers. Therefore the dielectric functions of PS oxidized in dry O
2 at temperatures up to 950
°C were determined. A continuous variation of the porosity and hence the refractive index with depth was used to realize so-called rugate filters. This type of interference filter allows the design of structures with more complex reflectance or transmittance characteristics than structures consisting of discrete single layers. © 1997 Elsevier Science S.A.</abstract><pub>Elsevier B.V</pub><doi>10.1016/S0040-6090(96)09361-3</doi><tpages>4</tpages></addata></record> |
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subjects | Oxidation PS layers Thermal oxidation |
title | Dielectric filters made of PS: advanced performance by oxidation and new layer structures |
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