Dielectric filters made of PS: advanced performance by oxidation and new layer structures

For the formation of PS dielectric filters a detailed calibration of the etch rates and refractive indices is required. The effective dielectric function of PS was determined for different substrate doping levels as a function of the anodization current density by fitting reflectance spectra. Based...

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Veröffentlicht in:Thin solid films 1997-04, Vol.297 (1), p.237-240
Hauptverfasser: Berger, M.G, Arens-Fischer, R, Thönissen, M, Krüger, M, Billat, S, Lüth, H, Hilbrich, S, Theiß, W, Grosse, P
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Sprache:eng
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Zusammenfassung:For the formation of PS dielectric filters a detailed calibration of the etch rates and refractive indices is required. The effective dielectric function of PS was determined for different substrate doping levels as a function of the anodization current density by fitting reflectance spectra. Based on these results a number of different dielectric filters were realized. For device applications a thermal oxidation step is necessary to reduce aging effects which occur as a result of the native oxidation of PS. In addition, thermal oxidation results in a qualitatively improve filter performance due to a reduced absorption in the PS layers. Therefore the dielectric functions of PS oxidized in dry O 2 at temperatures up to 950 °C were determined. A continuous variation of the porosity and hence the refractive index with depth was used to realize so-called rugate filters. This type of interference filter allows the design of structures with more complex reflectance or transmittance characteristics than structures consisting of discrete single layers. © 1997 Elsevier Science S.A.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(96)09361-3