Dielectric filters made of PS: advanced performance by oxidation and new layer structures
For the formation of PS dielectric filters a detailed calibration of the etch rates and refractive indices is required. The effective dielectric function of PS was determined for different substrate doping levels as a function of the anodization current density by fitting reflectance spectra. Based...
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Veröffentlicht in: | Thin solid films 1997-04, Vol.297 (1), p.237-240 |
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Hauptverfasser: | , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | For the formation of PS dielectric filters a detailed calibration of the etch rates and refractive indices is required. The effective dielectric function of PS was determined for different substrate doping levels as a function of the anodization current density by fitting reflectance spectra. Based on these results a number of different dielectric filters were realized. For device applications a thermal oxidation step is necessary to reduce aging effects which occur as a result of the native oxidation of PS. In addition, thermal oxidation results in a qualitatively improve filter performance due to a reduced absorption in the PS layers. Therefore the dielectric functions of PS oxidized in dry O
2 at temperatures up to 950
°C were determined. A continuous variation of the porosity and hence the refractive index with depth was used to realize so-called rugate filters. This type of interference filter allows the design of structures with more complex reflectance or transmittance characteristics than structures consisting of discrete single layers. © 1997 Elsevier Science S.A. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/S0040-6090(96)09361-3 |