Influence of deposition rates and thickness on the electrical resistivity and thermoelectric power of thin iron films

The electrical resistance and the thermopower of thin iron films were measured near room temperature as a function of deposition rate and thickness. The films were deposited on glass plates in a high vacuum system at pressures in the region of 10 -7 Torr. Deviations of the resistivity and the Seebec...

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Veröffentlicht in:	Thin solid films 1994-11, Vol.251 (2), p.99-102
Hauptverfasser:	Schepis, Randy S., Matienzo, L.J., Emmi, F., Unertl, William, Schröder, Klaus
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Deposition process Electrical properties and measurements Exact sciences and technology Iron Physics Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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Zusammenfassung:	The electrical resistance and the thermopower of thin iron films were measured near room temperature as a function of deposition rate and thickness. The films were deposited on glass plates in a high vacuum system at pressures in the region of 10 -7 Torr. Deviations of the resistivity and the Seebeck coefficient from bulk values increased with decreasing deposition rates.
ISSN:	0040-6090 1879-2731
DOI:	10.1016/0040-6090(94)90671-8