Modification of chemically deposited ZnSe thin films by ion exchange reaction with copper ions in solution
The modification of chemically deposited ZnSe thin films of ∼ 0.3 μm thickness by ion exchange in dilute solutions 0.001 M–0.025 M of CuCl 2 has been investigated. The ion exchange reaction, as studied by XPS depth profile analysis, shows Cu/Zn ratios of 0.32 and 90 for a 90 s ion exchange in 0.001...
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Veröffentlicht in: | Thin solid films 1994-07, Vol.247 (2), p.208-212 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | The modification of chemically deposited ZnSe thin films of ∼ 0.3 μm thickness by ion exchange in dilute solutions 0.001 M–0.025 M of CuCl
2 has been investigated. The ion exchange reaction, as studied by XPS depth profile analysis, shows Cu/Zn ratios of 0.32 and 90 for a 90 s ion exchange in 0.001 M CuCl
2 and a 3 min ion exchange in 0.01 M CuCl
2, respectively. Following ion exchange, the binding energies are measured as 952 eV for Cu 2p
1
2
, 932 eV for Cu 2p
3
2
and 54.5 eV for Se 3d
5
2
. The corresponding values for CuSe thin film deposited directly from a chemical bath are 952, 932.5 and 55 eV. Optical transmittance spectra and sheet resistance measurements of the ion-exchanged films compare favourably with directly deposited CuSe thin films, which indicates the formation of CuSe. These results demonstrate that thin films of semiconducting materials can be prepared in a simple manner by ion exchange. |
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ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/0040-6090(94)90801-X |