Electron spectroscopy for chemical analysis studies on electron beam evaporated CuOx thin films
Electron spectroscopy for chemical analysis studies has been carried out on CuOx films deposited onto yttria-stabilized zirconia single crystal substrates by electron beam evaporation under molecular beam epitaxy conditions. The results showed that copper oxide dissociated under electron beam heatin...
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| Veröffentlicht in: | Thin solid films 1994-09, Vol.249 (2), p.140-143 |
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| container_title | Thin solid films |
| container_volume | 249 |
| creator | KOTHIYAL, G. P MUTHE, K. P VYAS, J. C GANDHI, D. P HANDU, V. K SINGH, K. D SABHARWAL, S. C GUPTA, M. K |
| description | Electron spectroscopy for chemical analysis studies has been carried out on CuOx films deposited onto yttria-stabilized zirconia single crystal substrates by electron beam evaporation under molecular beam epitaxy conditions. The results showed that copper oxide dissociated under electron beam heating in high vacuum and the reassociation of copper and oxygen to form suboxide (CuOx) at the substrate was a function of its temperature. The maximum oxygen content was found to be about 46 percent of the starting source material at the growth temperature of 500 C, above which the CuOx film started to decompose. |
| doi_str_mv | 10.1016/0040-6090(94)90751-X |
| format | Article |
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The maximum oxygen content was found to be about 46 percent of the starting source material at the growth temperature of 500 C, above which the CuOx film started to decompose.</description><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Molecular, atomic, ion, and chemical beam epitaxy</subject><subject>Physics</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1994</creationdate><recordtype>article</recordtype><recordid>eNo9kEtLAzEUhYMoWKv_wEUWIroYvXlMZrKUUh9Q6Eahu3Ank9DIvJxMxf57p7Z2dc_iOwfuR8g1gwcGTD0CSEgUaLjT8l5DlrJkdUImLM90wjPBTsnkiJyTixg_AYBxLibEzCtnh75taOz-QrRtt6W-7alduzpYrCg2WG1jiDQOmzK4SEfa_dcKhzV139i1PQ6upLPN8ocO69BQH6o6XpIzj1V0V4c7JR_P8_fZa7JYvrzNnhaJFaCHJLVSQ54DszxjWe6ZY6JgWqMqsJCYpkKqtPBoURaFKFPLpVc612WeCRCyFFNyu9_t-vZr4-Jg6hCtqypsXLuJhispeJqpEZR70I6_xt550_Whxn5rGJidTbNTZXaqjJbmz6ZZjbWbwz7G0YnvsbEhHruSM6ZyJX4BlP11og</recordid><startdate>19940915</startdate><enddate>19940915</enddate><creator>KOTHIYAL, G. 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K</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electron spectroscopy for chemical analysis studies on electron beam evaporated CuOx thin films</atitle><jtitle>Thin solid films</jtitle><date>1994-09-15</date><risdate>1994</risdate><volume>249</volume><issue>2</issue><spage>140</spage><epage>143</epage><pages>140-143</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>Electron spectroscopy for chemical analysis studies has been carried out on CuOx films deposited onto yttria-stabilized zirconia single crystal substrates by electron beam evaporation under molecular beam epitaxy conditions. The results showed that copper oxide dissociated under electron beam heating in high vacuum and the reassociation of copper and oxygen to form suboxide (CuOx) at the substrate was a function of its temperature. 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| ispartof | Thin solid films, 1994-09, Vol.249 (2), p.140-143 |
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| source | Elsevier ScienceDirect Journals Complete |
| subjects | Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Molecular, atomic, ion, and chemical beam epitaxy Physics |
| title | Electron spectroscopy for chemical analysis studies on electron beam evaporated CuOx thin films |
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