Calorimetric analysis of thin-film reactions: Experiments and modeling in the nickel/silicon system
Thin-film reactions between nickel and silicon are investigated by differential scanning calorimetry and transmission electron microscopy on evaporated bilayers with different compositions and thicknesses. The thermograms are interpreted by a computer modeling, based on diffusion-controlled growth....
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| Veröffentlicht in: | Journal of applied physics 1994-11, Vol.76 (9), p.5195-5201 |
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| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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