Calorimetric analysis of thin-film reactions: Experiments and modeling in the nickel/silicon system
Thin-film reactions between nickel and silicon are investigated by differential scanning calorimetry and transmission electron microscopy on evaporated bilayers with different compositions and thicknesses. The thermograms are interpreted by a computer modeling, based on diffusion-controlled growth....
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| Veröffentlicht in: | Journal of applied physics 1994-11, Vol.76 (9), p.5195-5201 |
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| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | Thin-film reactions between nickel and silicon are investigated by differential scanning calorimetry and transmission electron microscopy on evaporated bilayers with different compositions and thicknesses. The thermograms are interpreted by a computer modeling, based on diffusion-controlled growth. Experiments and simulation reveal the simultaneous formation of crystalline Ni2Si and of an amorphous phase of composition probably near NiSi. The derived kinetic data confirm literature values from isothermal experiments. |
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| ISSN: | 0021-8979 1089-7550 |
| DOI: | 10.1063/1.357238 |