Use of neural networks for LPCVD reactors modelling
In this paper an alternative approach to LPCVD modelling is presented. The reactor has been broken up into a number of basic elements. A neural network has been elaborated to represent this basic element. The objective is to provide a simulation model which can be used to compute on-line the film th...
Gespeichert in:
| Veröffentlicht in: | Computers & chemical engineering 1996, Vol.20, p.S521-S526 |
|---|---|
| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | S526 |
|---|---|
| container_issue | |
| container_start_page | S521 |
| container_title | Computers & chemical engineering |
| container_volume | 20 |
| creator | Fakhr-Eddine, K. Cabassud, M. Duverneuil, P. Le Lann, M.V. Couderc, J.P. |
| description | In this paper an alternative approach to LPCVD modelling is presented. The reactor has been broken up into a number of basic elements. A neural network has been elaborated to represent this basic element. The objective is to provide a simulation model which can be used to compute on-line the film thickness on each wafer in order to develop a controller of LPCVD reactors. |
| doi_str_mv | 10.1016/0098-1354(96)00096-8 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_26367477</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>0098135496000968</els_id><sourcerecordid>26367477</sourcerecordid><originalsourceid>FETCH-LOGICAL-c364t-8049fc0ea158b3dd926f1317b241f5a676539cd66243cfd0fed8324bfc7d85253</originalsourceid><addsrcrecordid>eNp9kE9LAzEQxYMoWKvfwMMeRPSwmmyySfYiSOs_KOjBeg1pMpHodlOTreK3N0tLj56GB7_3Zt4gdErwFcGEX2PcyJLQml00_BJnxUu5h0ZECloyKup9NNohh-gopY8MVUzKEaLzBEVwRQfrqNs8-p8QP1PhQixmL5O3aRFBmz7EVCyDhbb13fsxOnC6TXCynWM0v797nTyWs-eHp8ntrDSUs76UmDXOYNCklgtqbVNxRygRi4oRV2sueE0bYzmvGDXOYgdW0ootnBFW1lVNx-h8k7uK4WsNqVdLn0y-QXcQ1klVnHLBhMgg24AmhpQiOLWKfqnjryJYDR9SQ3011FfNIPKHlMy2s22-Tka3LurO-LTzUoIl4QN2s8Egd_32EFUyHjoD1kcwvbLB_7_nD3EWeBQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>26367477</pqid></control><display><type>article</type><title>Use of neural networks for LPCVD reactors modelling</title><source>Elsevier ScienceDirect Journals</source><creator>Fakhr-Eddine, K. ; Cabassud, M. ; Duverneuil, P. ; Le Lann, M.V. ; Couderc, J.P.</creator><creatorcontrib>Fakhr-Eddine, K. ; Cabassud, M. ; Duverneuil, P. ; Le Lann, M.V. ; Couderc, J.P.</creatorcontrib><description>In this paper an alternative approach to LPCVD modelling is presented. The reactor has been broken up into a number of basic elements. A neural network has been elaborated to represent this basic element. The objective is to provide a simulation model which can be used to compute on-line the film thickness on each wafer in order to develop a controller of LPCVD reactors.</description><identifier>ISSN: 0098-1354</identifier><identifier>EISSN: 1873-4375</identifier><identifier>DOI: 10.1016/0098-1354(96)00096-8</identifier><identifier>CODEN: CCENDW</identifier><language>eng</language><publisher>Oxford: Elsevier Ltd</publisher><subject>Applied sciences ; Chemical engineering ; Exact sciences and technology ; Reactors</subject><ispartof>Computers & chemical engineering, 1996, Vol.20, p.S521-S526</ispartof><rights>1996</rights><rights>1996 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c364t-8049fc0ea158b3dd926f1317b241f5a676539cd66243cfd0fed8324bfc7d85253</citedby><cites>FETCH-LOGICAL-c364t-8049fc0ea158b3dd926f1317b241f5a676539cd66243cfd0fed8324bfc7d85253</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/0098135496000968$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,3537,4010,4036,4037,23909,23910,25118,27900,27901,27902,65306</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=3108168$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Fakhr-Eddine, K.</creatorcontrib><creatorcontrib>Cabassud, M.</creatorcontrib><creatorcontrib>Duverneuil, P.</creatorcontrib><creatorcontrib>Le Lann, M.V.</creatorcontrib><creatorcontrib>Couderc, J.P.</creatorcontrib><title>Use of neural networks for LPCVD reactors modelling</title><title>Computers & chemical engineering</title><description>In this paper an alternative approach to LPCVD modelling is presented. The reactor has been broken up into a number of basic elements. A neural network has been elaborated to represent this basic element. The objective is to provide a simulation model which can be used to compute on-line the film thickness on each wafer in order to develop a controller of LPCVD reactors.</description><subject>Applied sciences</subject><subject>Chemical engineering</subject><subject>Exact sciences and technology</subject><subject>Reactors</subject><issn>0098-1354</issn><issn>1873-4375</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1996</creationdate><recordtype>article</recordtype><recordid>eNp9kE9LAzEQxYMoWKvfwMMeRPSwmmyySfYiSOs_KOjBeg1pMpHodlOTreK3N0tLj56GB7_3Zt4gdErwFcGEX2PcyJLQml00_BJnxUu5h0ZECloyKup9NNohh-gopY8MVUzKEaLzBEVwRQfrqNs8-p8QP1PhQixmL5O3aRFBmz7EVCyDhbb13fsxOnC6TXCynWM0v797nTyWs-eHp8ntrDSUs76UmDXOYNCklgtqbVNxRygRi4oRV2sueE0bYzmvGDXOYgdW0ootnBFW1lVNx-h8k7uK4WsNqVdLn0y-QXcQ1klVnHLBhMgg24AmhpQiOLWKfqnjryJYDR9SQ3011FfNIPKHlMy2s22-Tka3LurO-LTzUoIl4QN2s8Egd_32EFUyHjoD1kcwvbLB_7_nD3EWeBQ</recordid><startdate>1996</startdate><enddate>1996</enddate><creator>Fakhr-Eddine, K.</creator><creator>Cabassud, M.</creator><creator>Duverneuil, P.</creator><creator>Le Lann, M.V.</creator><creator>Couderc, J.P.</creator><general>Elsevier Ltd</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SC</scope><scope>8FD</scope><scope>JQ2</scope><scope>L7M</scope><scope>L~C</scope><scope>L~D</scope></search><sort><creationdate>1996</creationdate><title>Use of neural networks for LPCVD reactors modelling</title><author>Fakhr-Eddine, K. ; Cabassud, M. ; Duverneuil, P. ; Le Lann, M.V. ; Couderc, J.P.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c364t-8049fc0ea158b3dd926f1317b241f5a676539cd66243cfd0fed8324bfc7d85253</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1996</creationdate><topic>Applied sciences</topic><topic>Chemical engineering</topic><topic>Exact sciences and technology</topic><topic>Reactors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Fakhr-Eddine, K.</creatorcontrib><creatorcontrib>Cabassud, M.</creatorcontrib><creatorcontrib>Duverneuil, P.</creatorcontrib><creatorcontrib>Le Lann, M.V.</creatorcontrib><creatorcontrib>Couderc, J.P.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Computer and Information Systems Abstracts</collection><collection>Technology Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Computer and Information Systems Abstracts Academic</collection><collection>Computer and Information Systems Abstracts Professional</collection><jtitle>Computers & chemical engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fakhr-Eddine, K.</au><au>Cabassud, M.</au><au>Duverneuil, P.</au><au>Le Lann, M.V.</au><au>Couderc, J.P.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Use of neural networks for LPCVD reactors modelling</atitle><jtitle>Computers & chemical engineering</jtitle><date>1996</date><risdate>1996</risdate><volume>20</volume><spage>S521</spage><epage>S526</epage><pages>S521-S526</pages><issn>0098-1354</issn><eissn>1873-4375</eissn><coden>CCENDW</coden><abstract>In this paper an alternative approach to LPCVD modelling is presented. The reactor has been broken up into a number of basic elements. A neural network has been elaborated to represent this basic element. The objective is to provide a simulation model which can be used to compute on-line the film thickness on each wafer in order to develop a controller of LPCVD reactors.</abstract><cop>Oxford</cop><pub>Elsevier Ltd</pub><doi>10.1016/0098-1354(96)00096-8</doi></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0098-1354 |
| ispartof | Computers & chemical engineering, 1996, Vol.20, p.S521-S526 |
| issn | 0098-1354 1873-4375 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_26367477 |
| source | Elsevier ScienceDirect Journals |
| subjects | Applied sciences Chemical engineering Exact sciences and technology Reactors |
| title | Use of neural networks for LPCVD reactors modelling |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-30T08%3A03%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Use%20of%20neural%20networks%20for%20LPCVD%20reactors%20modelling&rft.jtitle=Computers%20&%20chemical%20engineering&rft.au=Fakhr-Eddine,%20K.&rft.date=1996&rft.volume=20&rft.spage=S521&rft.epage=S526&rft.pages=S521-S526&rft.issn=0098-1354&rft.eissn=1873-4375&rft.coden=CCENDW&rft_id=info:doi/10.1016/0098-1354(96)00096-8&rft_dat=%3Cproquest_cross%3E26367477%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=26367477&rft_id=info:pmid/&rft_els_id=0098135496000968&rfr_iscdi=true |