Use of neural networks for LPCVD reactors modelling

Use of neural networks for LPCVD reactors modelling

In this paper an alternative approach to LPCVD modelling is presented. The reactor has been broken up into a number of basic elements. A neural network has been elaborated to represent this basic element. The objective is to provide a simulation model which can be used to compute on-line the film th...

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Veröffentlicht in:Computers & chemical engineering 1996, Vol.20, p.S521-S526
Hauptverfasser: Fakhr-Eddine, K., Cabassud, M., Duverneuil, P., Le Lann, M.V., Couderc, J.P.
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Chemical engineering
Exact sciences and technology
Reactors
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Zusammenfassung:In this paper an alternative approach to LPCVD modelling is presented. The reactor has been broken up into a number of basic elements. A neural network has been elaborated to represent this basic element. The objective is to provide a simulation model which can be used to compute on-line the film thickness on each wafer in order to develop a controller of LPCVD reactors.
ISSN:0098-1354
1873-4375
DOI:10.1016/0098-1354(96)00096-8