Observation of Chemical Etching Morphology of Aluminum Foil

Observation of Chemical Etching Morphology of Aluminum Foil

Aluminum foil (99.7%Al, 0.3%Cu, thickness of 50 mm) was etched in the etchant of 1mol dm exp -3 HCl and 1.11mol dm exp -3 AlCl sub 3 and at 75 deg C. The morphology of chemical etched Al foil was observed. Etch pit is in the form of cube. The thickness of etch film is 2-4 nm. It is possible to obser...

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Veröffentlicht in:Hyōmen gijutsu 1994/01/01, Vol.45(1), pp.114-115
Hauptverfasser: MATSUBARA, Hiroshi, UCHI, Hidenori, YAMADA, Akifumi
Format: Artikel
Sprache:eng ; jpn
Schlagworte:
Aluminum
Chemical Etching
Electron Microscopy
Microstructure
Morphology
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Zusammenfassung:Aluminum foil (99.7%Al, 0.3%Cu, thickness of 50 mm) was etched in the etchant of 1mol dm exp -3 HCl and 1.11mol dm exp -3 AlCl sub 3 and at 75 deg C. The morphology of chemical etched Al foil was observed. Etch pit is in the form of cube. The thickness of etch film is 2-4 nm. It is possible to observe the etch film stripped from Al foil in bromine-methanol solution by TEM, which is an effective method for observing the fine structure of chemical etched Al foil.
ISSN:0915-1869
1884-3409
DOI:10.4139/sfj.45.114