Wet chemical etching of silicate glasses in hydrofluoric acid based solutions

Wet chemical etching of silicate glasses in hydrofluoric acid based solutions

Mechanism of the dissolution reaction is governed by the adsorption of the two reactive species: HF and HF sub 2 sup - and the catalytic action of H sup + ions, resulting in the breakage of the siloxane bonds in the silicate network. 126 refs.

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Veröffentlicht in:Journal of materials science 1993-12, Vol.28 (23), p.6261-6273
1. Verfasser: SPIERINGS, G. A. C. M
Format: Artikel
Sprache:eng
Schlagworte:
Applied sciences
Building materials. Ceramics. Glasses
Chemical industry and chemicals
Exact sciences and technology
Glasses
Structure, analysis, properties
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Zusammenfassung:Mechanism of the dissolution reaction is governed by the adsorption of the two reactive species: HF and HF sub 2 sup - and the catalytic action of H sup + ions, resulting in the breakage of the siloxane bonds in the silicate network. 126 refs.
ISSN:0022-2461
1573-4803
DOI:10.1007/bf01352182