Atomic resolution with an atomic force microscope using piezoresistive detection

A new detection scheme for atomic force microscopy (AFM) is shown to yield atomic resolution images of conducting and nonconducting layered materials. This detection scheme uses a piezoresistive strain sensor embedded in the AFM cantilever. The cantilever is batch fabricated using standard silicon m...

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Veröffentlicht in:Applied physics letters 1993-02, Vol.62 (8), p.834-836
Hauptverfasser: TORTONESE, M, BARRETT, R. C, QUATE, C. F
Format: Artikel
Sprache:eng
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Zusammenfassung:A new detection scheme for atomic force microscopy (AFM) is shown to yield atomic resolution images of conducting and nonconducting layered materials. This detection scheme uses a piezoresistive strain sensor embedded in the AFM cantilever. The cantilever is batch fabricated using standard silicon micromachining techniques. The deflection of the cantilever is measured directly from the resistance of the piezoresistive strain sensor without the need for external deflection sensing elements. Using this cantilever we achieved 0.1 Årms vertical resolution in a 10 Hz–1 kHz bandwidth.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.108593