Substantial diffusion of Zr during solid-state amorphization in Ni/Zr multilayers

Magnetron sputtered specimens show planar and sharp interfaces between Ni and Zr layers. The amorphous phase is clearly observed at the residual Ni layers and around the void edge in the Zr layer by TEM of samples annealed at 300\0\C for 1 h. Energy dispersive X-ray (EDX) analysis verifies that cons...

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Veröffentlicht in:Journal of materials science. Materials in electronics 1996-02, Vol.7 (1), p.47-50
Hauptverfasser: Chang, Sang-Gweon, Lee, Ki-Young, Yong, Yoon-Joong, Lee, Jai-Young, Kim, Geun-Hong, Chun, Chang-Hwan
Format: Artikel
Sprache:eng
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Zusammenfassung:Magnetron sputtered specimens show planar and sharp interfaces between Ni and Zr layers. The amorphous phase is clearly observed at the residual Ni layers and around the void edge in the Zr layer by TEM of samples annealed at 300\0\C for 1 h. Energy dispersive X-ray (EDX) analysis verifies that considerable Zr diffusion occurs through the grain boundary in the Ni layer during annealing. It is clearly shown that amorphous NiZr alloy formation occurs when Zr diffusion is comparable to Ni diffusion. (Abstract quotes from original text)
ISSN:0957-4522
1573-482X
DOI:10.1007/BF00194092