Recent advances in plasma source ion implantation at Los Alamos National Laboratory

Plasma source ion implantation (PSII) is an environmentally benign, potentially cost-effective alternative to conventional lineof-sight, accelerator-based implantation and wet-chemical plating processes. PSII offers the potential of producing a high dose of ions in a relatively simple, fast and cost...

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Veröffentlicht in:	Surface & coatings technology 1996-10, Vol.84 (1), p.528-536
Hauptverfasser:	Munson, Carter P., Faehl, R.J., Henins, I., Nastasi, M., Reass, W.A., Rej, D.J., Scheuer, J.T., Walter, K.C., Wood, B.P.
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Diamond-like carbon Exact sciences and technology Implantation Ion and electron beam-assisted deposition ion plating Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Plasma
Online-Zugang:	Volltext
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