Radio frequency sputtered cobalt oxide coating : structural, optical and electrochemical characterization

Cobalt oxide thin films (thickness 2000 Å) with different stoichiometries were deposited by reactive rf sputtering. The variation of the oxygen partial pressure lead to films with compositions varying from metallic cobalt to CO3O4, as determined by x-ray diffraction and x-ray photoelectron spectrosc...

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Veröffentlicht in:	Journal of applied physics 1993-11, Vol.74 (9), p.5835-5841
Hauptverfasser:	ESTRADA, W, FANTINI, M. C. A, DE CASTRO, S. C, POLO DA FONSECA, C. N, GORENSTEIN, A
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Electrooptical effects Exact sciences and technology Insulators Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of bulk materials and thin films Optical properties of specific thin films Physics
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Zusammenfassung:	Cobalt oxide thin films (thickness 2000 Å) with different stoichiometries were deposited by reactive rf sputtering. The variation of the oxygen partial pressure lead to films with compositions varying from metallic cobalt to CO3O4, as determined by x-ray diffraction and x-ray photoelectron spectroscopy. The electrochromic properties of the films were investigated in aqueous electrolytes (0.1 M KOH). The initial electrochemical behavior of the films is strongly dependent on the film deposition conditions, but after cycling the electrochemical/electrochromic characteristics of the different deposits were quite similar. Transmittance changes and electrochromic efficiency are discussed.
ISSN:	0021-8979 1089-7550
DOI:	10.1063/1.354203