Quantitative texture analysis of thin polycrystalline layers

Understanding the physical properties of ultrathin layers (nanometre range) helps in manufacturing control. A quantitative x-ray diffraction investigation of preferred orientations in thin polycrystalline mono- and multilayers is presented. The Schulz reflection method and a parallel beam geometry a...

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Veröffentlicht in:Materials science forum 1993-09, Vol.157-162, p.97-102
Hauptverfasser: Bermig, G, Tobisch, J, Helming, K
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description Understanding the physical properties of ultrathin layers (nanometre range) helps in manufacturing control. A quantitative x-ray diffraction investigation of preferred orientations in thin polycrystalline mono- and multilayers is presented. The Schulz reflection method and a parallel beam geometry at small incidence angles for pole figure measurement are used. Some monolayers of thickness 50-600 nm, e.g. nickel, titanium nitride, CeO sub 2 , and a four-layer system (MgF sub 2 /CeO sub 2 /Y sub 2 O sub 3 /Fe) prepared by vapour deposition, are analyzed. Quantitative determination of preferred orientations is carried out according to the component method by Helming and Eschner (Cryst. Res. Technol., 1990, 25, K203).
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